Rev 4851 | Blame | Compare with Previous | Last modification | View Log | Download | RSS feed
\name{Oxide}\alias{Oxide}\title{Variability in Semiconductor Manufacturing}\description{The \code{Oxide} data frame has 72 rows and 5 columns.}\format{This data frame contains the following columns:\describe{\item{Source}{a factor with levels\code{1} and\code{2}}\item{Lot}{a factor giving a unique identifier for each lot.}\item{Wafer}{a factor giving a unique identifier for each wafer within a lot.}\item{Site}{a factor with levels\code{1},\code{2}, and\code{3}}\item{Thickness}{a numeric vector giving the thickness of the oxide layer.}}}\details{These data are described in Littell et al. (1996, p. 155) as coming``from a passive data collection study in the semiconductor industrywhere the objective is to estimate the variance components todetermine the assignable causes of the observed variability.'' Theobserved response is the thickness of the oxide layer on siliconwafers, measured at three different sites of each of three wafersselected from each of eight lots sampled from the population oflots.}\source{Pinheiro, J. C. and Bates, D. M. (2000), \emph{Mixed-Effects Models in Sand S-PLUS}, Springer, New York. (Appendix A.20)Littell, R. C., Milliken, G. A., Stroup, W. W. and Wolfinger,R. D. (1996), \emph{SAS System for Mixed Models}, SAS Institute,Cary, NC.}\examples{str(Oxide)}\keyword{datasets}